设备名称 Equipment Name
管式A&P设备 Horizontal PEALD (A&P)
管式A&P设备型号 Equipment Model
PD-520L/PD-520MAX
设备用途 Equipment Application
AlO+SiN薄膜沉积。
AlO+SiN Thin-film Deposition.
管式A&P设备技术特点 Features
1、原子层沉积工艺特性,成膜均匀性好。
Atomic layer deposition process, with better film uniformity.
2、同机台或同管完成多层膜沉积,减少工艺环节,有效提升良率、降低碎片率。
Multi-layer thin film deposited in the same process equipment or same furnace tube, reducing process steps and wafer breakage rate, improving yield effectively.
3、自主研发液态源前驱体蒸气输送与前驱体快速切换技术。
Independent R&D of liquid source precursor vapor delivery and precursor rapid switching technology.
4、适应不同前驱体、不同材料钝化层沉积,工艺拓展空间大。
Suitable for deposition of passivation layer for different precursors and materials, with a large space for process expansion.
设备参数 Parameters
·最大兼容硅片尺寸:230mm
·Max.Compatible Wafer Size:□230mm
·单机管数:6管
·Tube Configuration:5 tubes/6 tubes
·单管装片量Loading Capacity/Tube
机型Model:182□210
PD-520L(6管):640片/管(pcs/tube)\504片/管(pcs/tube)
PD-520MAX(6管):768片/管(pcs/tube)\616片/管(pcs/tube)
·单机产能Throughput
机型Model:182\210
PD-520L(6管/tubes):3100片/小时(pcs/h)\2450片/小时(pcs/h)
PD-520LMAX(6管/tubes):3700片/小时(pcs/h)\3000片/小时(pcs/h)
·外形尺寸(mm,含地脚、不含泵)Footprint (mm, incl. leveling foot, excl. pumps)
PD-520L:9570x2150x4410(6管/tubes)
PD-520MAX:11050x2150x4500(6管/tubes)